发明名称 |
Apparatus and method for delivering process gas to a substrate processing system |
摘要 |
A method and apparatus for delivering process fluids to a substrate processing system is described herein. In one embodiment, the fluid delivery system may include a first conduit for coupling a first fluid to the substrate processing system with a first flow controller for controlling the flow of the first fluid through the first conduit; a second conduit for coupling a second fluid to the substrate processing system with a second flow controller for controlling the flow of the second fluid through the second conduit; and a third conduit for coupling the second fluid to the substrate processing system with a third flow controller for controlling the flow of the second fluid through the third conduit. The fluid delivery system may be used to deliver processing fluids to a substrate processing system during semiconductor fabrication.
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申请公布号 |
US2004050325(A1) |
申请公布日期 |
2004.03.18 |
申请号 |
US20020243377 |
申请日期 |
2002.09.12 |
申请人 |
SAMOILOV ARKADII V.;COMITA PAUL B. |
发明人 |
SAMOILOV ARKADII V.;COMITA PAUL B. |
分类号 |
C23C16/44;C23C16/455;H01L21/00;(IPC1-7):C23C16/00;C23F1/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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