发明名称 CRYSTALLINE SULFIDE THIN FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a crystalline sulfide thin film in which proper characteristics affected by chemical bonding properties is held and film thickness after photo-induced structural phase transition (PSPT) is made extremely small. SOLUTION: A crystalline thin film composed of the sulfides of lanthanoid series or the sulfides of transition metals is irradiated with a laser beam to form a crystal structure in which structural phase transition is brought about. By this procedure, physical properties intermediate between those of oxides and those of selenides can be provided, the various characteristics of optical components, recording media, circuit components, sensors, etc., can be improved and working for making film thickness extremely thin after PSPT can be made highly precise and simplified. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004083933(A) 申请公布日期 2004.03.18
申请号 JP20020242735 申请日期 2002.08.22
申请人 JAPAN SCIENCE & TECHNOLOGY CORP 发明人 TAKEBE HIROMICHI;MORINAGA KENJI
分类号 C01G1/12;C01F17/00;C03C17/22;C23C14/06;C23C14/58;(IPC1-7):C23C14/06 主分类号 C01G1/12
代理机构 代理人
主权项
地址