ALIGNMENT METHOD, ALIGNMENT SUBSTRATE, PRODUCTION METHOD FOR ALIGNMENT SUBSTRATE, EXPOSURE METHOD, EXPOSURE SYSTEM AND MASK PRODUCING METHOD

摘要

An alignment method capable of providing an alignment without providing an alignment mark on a mask and preventing a decrease in exposure throughput/latent image contrast; an alignment substrate and a production method therefore; an exposure method; an exposure system; a mask producing method. The alignment method comprises the step of allowing light or charged particle beam to pass from the first surface side to the second surface side of a thin film, reflecting light or charged particle beam off a plurality of alignment marks disposed on the second surface side of, and outside, the thin film, and detecting the reflected light or charge particle beam on the first surface side to detect the positions of the alignment marks, and the step of determining the position coordinates on the thin film using the detected position of alignment marks; the alignment substrate and the production method therefore using the alignment method; the exposure method and the exposure system performing such an alignment; and the mask producing method.