发明名称 |
Radiation converting substrate, radiation image pickup apparatus and radiation image pickup system |
摘要 |
<p>A moisture-preventing protective layer is formed covering a phosphor layer (12) formed on a substrate (11) for converting a radiation into light. The moisture-preventing protective layer has two plasma polymerization films (13,14) formed from a monomer of a silane compound and fluorine containing unsaturated hydrocarbon, respectively. Independent claims are also included for the following: (1) radiation image pick-up apparatus; and (2) radiation image pick-up system.</p> |
申请公布号 |
EP1398648(A2) |
申请公布日期 |
2004.03.17 |
申请号 |
EP20030020612 |
申请日期 |
2003.09.10 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
OGAWA, YOSHIHIRO;EMOTO, KENGO |
分类号 |
G01T1/20;A61B6/00;G01T1/24;H01L27/14;(IPC1-7):G01T1/20 |
主分类号 |
G01T1/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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