发明名称 Radiation converting substrate, radiation image pickup apparatus and radiation image pickup system
摘要 <p>A moisture-preventing protective layer is formed covering a phosphor layer (12) formed on a substrate (11) for converting a radiation into light. The moisture-preventing protective layer has two plasma polymerization films (13,14) formed from a monomer of a silane compound and fluorine containing unsaturated hydrocarbon, respectively. Independent claims are also included for the following: (1) radiation image pick-up apparatus; and (2) radiation image pick-up system.</p>
申请公布号 EP1398648(A2) 申请公布日期 2004.03.17
申请号 EP20030020612 申请日期 2003.09.10
申请人 CANON KABUSHIKI KAISHA 发明人 OGAWA, YOSHIHIRO;EMOTO, KENGO
分类号 G01T1/20;A61B6/00;G01T1/24;H01L27/14;(IPC1-7):G01T1/20 主分类号 G01T1/20
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