发明名称 |
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
摘要 |
A method of generating a mask of use in printing a target pattern on a substrate. The method includes the steps of (a) determining a maximum width of features to be imaged on the substrate utilizing phase-structures formed in the mask; (b) identifying all features contained in the target pattern having a width which is equal to or less than the maximum width; (c) extracting all features having a width which is equal to or less than the maximum width from the target pattern; (d) forming phase-structures in the mask corresponding to all features identified in step (b); and (e) forming opaque structures in the mask for all features remaining in target pattern after performing step (c). <IMAGE> |
申请公布号 |
EP1349002(A3) |
申请公布日期 |
2004.03.17 |
申请号 |
EP20030251875 |
申请日期 |
2003.03.25 |
申请人 |
ASML MASKTOOLS B.V. |
发明人 |
VAN DEN BROEKE, DOUGLAS;CHEN, JANG FUNG;LAIDIG, THOMAS;WAMPLER, KURT E.;HSU, DUAN-FU STEPHEN |
分类号 |
G03F1/00;G03F7/20;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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地址 |
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