发明名称 Electroless platinum-rhodium alloy plating
摘要 The present invention relates to electroless plating of a platinum-rhodium alloy onto a substrate. More particularly, this invention pertains to an aqueous platinum and rhodium plating bath, a process for plating a uniform coating of a platinum-rhodium alloy onto various substrates using an electroless plating composition, and a platinum-rhodium plated article formed therefrom. This process is suitable for the deposition of a platinum-rhodium alloy on virtually any material of any geometrical shape, including fibers and powders.
申请公布号 US6706420(B1) 申请公布日期 2004.03.16
申请号 US20000611182 申请日期 2000.07.06
申请人 HONEYWELL INTERNATIONAL INC. 发明人 KOZLOV ALEXANDER S.;PALANISAMY THIRUMALAI;NARASIMHAN DAVE
分类号 C23C18/44;C23C18/48;H05K3/24;(IPC1-7):B32B15/00;B05D1/18;C23C18/16;C23C18/42 主分类号 C23C18/44
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