| 摘要 |
A system for detecting defects in a layer of dielectric material is disclosed. The disclosed system comprises a first electrode, on which the layer is placed, at least one second electrode oppositely spaced apart from the first electrode and oppositely spaced apart from, but not in contact with, the top surface of the layer. A voltage, that is at least equal to the breakdown voltage corresponding to the spacing between the first and second electrodes in the absence of the material layer, is applied across the first and second electrodes. The presence and characteristics, such as the location and the cross sectional area, of defects are detected as a function of the flow of electrical current from the first electrode to the at least one second electrode.
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