| 发明名称 |
VERFAHREN ZUR HERSTELLUNG SYNTHETISCHEN KIESELGLASES ZUR ANWENDUNG FÜR ARF-EXCIMER- LASERLITHOGRAPHIE |
| 摘要 |
An object of the present invention is to provide a simple method for producing a synthetic quartz glass having excellent homogeneity and high transmittance, which is useful as an optical material in producing steppers equipped with an ArF excimer laser as a radiation source. A method for producing a synthetic quartz glass for use in ArF excimer laser lithography, which comprises irradiating a highly homogeneous synthetic quartz glass containing less than 60 ppb of Na with an ultraviolet radiation having a maximum wavelength of 260 nm for not less than the duration expressed by the following equation 1: <MATH> wherein X represents an Na concentration (ppb), Y represents the duration of irradiation (hours), and Z represents the illuminance of an ultraviolet radiation on an irradiated surface (mW/cm<2>). |
| 申请公布号 |
AT261406(T) |
申请公布日期 |
2004.03.15 |
| 申请号 |
AT19990116937T |
申请日期 |
1999.08.27 |
| 申请人 |
HERAEUS QUARZGLAS GMBH & CO. KG;SHIN-ETSU QUARTZ CO., LTD. |
发明人 |
OSHIMA, TAKAYUKI;FUJINOKI, AKIRA;NISHIMURA, HIROYUKI;YAGINUMA, YASUYUKI |
| 分类号 |
H01L21/027;C03B20/00;C03C3/06;C03C23/00;G03F1/14;G03F1/60;(IPC1-7):C03C3/06 |
主分类号 |
H01L21/027 |
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