DRY FILM RESIST COMPOSITION

摘要

PURPOSE: Provided is a dry film resist composition which removes the bubbles generated in the agitating step to prevent unevenness of the surface of the dry film, to improve the productivity and to exclude the need for an excessive amount of defoamer. CONSTITUTION: The dry film resist composition comprises a binder polymer, a photopolymerizable monomer, a photopolymerization initiator and additives, wherein the composition further comprises a homopolymer of propylene glycol or ethylene glycol, or a copolymer thereof which is a polyalkylene glycol having a molecular weight of 100-1300. In particular, the polyalkylene glycol is present in the amount of 0.10-10 wt% in the total dry film resist composition.