发明名称 Selective etching device
摘要 The present invention provides an apparatus for producing finished sliders, the apparatus including a physical and chemical etching device, and a controller to direct the chemical and physical etching device onto a substrate consisting of a plurality of materials. The physical and chemical etch device provides a uniform etch rate throughout the plurality of materials in the substrate while also providing a desired property level of each of the plurality of materials.
申请公布号 US2004045671(A1) 申请公布日期 2004.03.11
申请号 US20030660441 申请日期 2003.09.10
申请人 REJDA ED;GATES JANE 发明人 REJDA ED;GATES JANE
分类号 G11B5/10;G11B5/31;G11B5/39;G11B5/60;(IPC1-7):C23F1/00 主分类号 G11B5/10
代理机构 代理人
主权项
地址