发明名称 METHOD AND APPARATUS TO CORRECT WAFER DRIFT
摘要 A method and apparatus is provided for determining workpiece drift from its nominal or intended position. The apparatus includes two proportionate sensors 19, each of which gives an output reading that depends upon how much of the sensor beam 24 is blocked by an edge of the workpiece 30. A computer can calculate positional drift based upon these readings. Also disclosed is a method for aligning proportionate sensors 19 to be parallel to one another.
申请公布号 WO02097869(A8) 申请公布日期 2004.03.11
申请号 WO2002US16715 申请日期 2002.05.28
申请人 ASM AMERICA, INC. 发明人 LU, ZHIMIN
分类号 H01L21/68;(IPC1-7):G05B19/401;H01L21/00 主分类号 H01L21/68
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