发明名称 SEMICONDUCTOR DEVICE AND ITS PRODUCING PROCESS, CIRCUIT BOARD AND ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To grind a semiconductor substrate to a substantially constant thickness while enhancing the productivity and yield. <P>SOLUTION: A protrusion 40 is formed on a semiconductor substrate 10 having a first region 20 and a second region 30 on the periphery thereof to project above the first region 20. A support 60 is provided on the side of the semiconductor substrate 10 where the protrusion 40 is formed such that a part overlapping the first region 20 becomes a through hole 61. The semiconductor substrate 10 is ground from the side of the semiconductor substrate 10 opposite to the side where the protrusion 40 is formed. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004079951(A) 申请公布日期 2004.03.11
申请号 JP20020241827 申请日期 2002.08.22
申请人 SEIKO EPSON CORP 发明人 KARASAWA FUMIAKI;YUZAWA TAKESHI
分类号 H01L21/304;H01L21/68;H01L21/78 主分类号 H01L21/304
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