| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a silica glass plate for a fluid circulation and its manufacturing method, wherein in particular in a plasma etching device, a reaction efficiency of a plasma etching or the like is good, and it is intended to miniaturize an assembly device of the plasma etching device or the like, and also a perforation process is facilitated. <P>SOLUTION: In the silica glass plate for the fluid circulation, a plurality of fluid circulation holes are provided in a flat plate-like silica glass substrate, and both ends of this fluid circulation hole are provided with a large diameter part which expands in diameter as advances outward. Further, its manufacturing method is disclosed. <P>COPYRIGHT: (C)2004,JPO</p> |
