CONTAMINATION INSPECTION METHOD AND DEVICE THEREOF

摘要

PROBLEM TO BE SOLVED: To suppress the occurrence of a false report without lowering detection sensitivity of contamination in the whole semiconductor wafer or a chip unit.

SOLUTION: A laser device 10 obliquely irradiates a light beam onto the surface of the semiconductor wafer 1, and a photoelectric transfer element 20 receives diffusion light generated on the surface of the semiconductor wafer 1 to output an image signal. An image processor 120 of a processor 100 compares mutual adjacent chip image signals with each other to output the difference. Coefficient tables 132 and 133 input coordinate information from a coordinate managing device 140 to output coefficients stored by corresponding to the coordinate information. A determination circuit 131 determines the contamination by using a threshold obtained to multiply a predetermined value by the coefficient input from the coefficient tables 132 and 133. The coefficient is modified on the basis of a preliminary result, and the threshold is made larger than that during the preliminary inspection in the inspection of a region where many false reports occur.

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