发明名称 DEVICE FOR MANUFACTURING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a device for manufacturing a semiconductor which can rapidly cool a wafer after heating the wafer in a gas atmosphere. SOLUTION: This device for manufacturing the semiconductor comprises a furnace tube 12, a heating part 44 arranged in the furnace tube, a cooling part 46 arranged in a different position from the heating part in the furnace tube, and a means 32 for transferring the wafer 34 between the heating part and the cooling part. The wafer is heated at the heating part and cooled at the cooling part. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004079794(A) 申请公布日期 2004.03.11
申请号 JP20020238255 申请日期 2002.08.19
申请人 FUJITSU LTD 发明人 TAKAHASHI HIDEKI;KANEDA HIROSHI
分类号 H01L21/683;H01L21/22;H01L21/324;H01L21/68;(IPC1-7):H01L21/324 主分类号 H01L21/683
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