| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a thin film for obtaining the consistent resistance and film thickness of less variance in performing film deposition of a resistor, a metal thin film or the like. SOLUTION: In the method and the apparatus for manufacturing the thin film, a monitor having an electrode pattern is provided on a plastic substrate, and the resistance is monitored and controlled so that the thin film is deposited only on resistance-detection portions of the monitor. COPYRIGHT: (C)2004,JPO
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