JUDGING SYSTEM FOR MASK DEFECT AND METHOD FOR JUDGING MASK DEFECT

摘要

PROBLEM TO BE SOLVED: To provide a judging system for mask defects and a method for judging mask defects by which the conditions for judging mask defects can be optimized and the detection sensitivity of a mask defect detecting device can be optimized.

SOLUTION: The system includes: a layout design block 1 to layout a plurality of mask defects with different insertion positions and sizes on an inspection photomask; a measuring block 7 to measure the electric characteristics of a semiconductor device on which mask defects are transferred from the inspection photomask and to obtain the failure map indicating positions of semiconductor devices showing electric failure; and a calculating block 17 of judging conditions to compare the coordinate values of the layout of the mask defects with the coordinate values of the position in the failure map and to total the mask defects inducing electric failure in terms of the size to calculate the judging conditions for mask defects.

COPYRIGHT: (C)2004,JPO