| 摘要 |
PROBLEM TO BE SOLVED: To provide a silicon boat for the heat treatment of a semiconductor, which is made of monocrystalline silicon to make the boat very strong at high temperatures and highly pure, which prevents the adherence of a silicon wafer to the silicon boat when the silicon wafer is heat-treated at a high temperature in a holding groove of the silicon boat, and hence which avoids the attachment of the silicon of the boat to a rear face of the silicon wafer when the silicon wafer heat-treated at a high temperature is retrieved from the boat. SOLUTION: The silicon boat 10 for the heat treatment of a semiconductor is used for the heat treatment of a monocrystalline silicon wafer. A wafer holding rod 4 for holding the monocrystalline silicon wafer is made of monocrystalline silicon, and the wafer holding groove 7 formed in the wafer holding rod 4 has a (111) crystal plane. COPYRIGHT: (C)2004,JPO |
