发明名称 METHOD FOR SOLDER-STOP STRUCTURING OF ELEVATIONS ON WAFERS
摘要 PURPOSE: A method for solder-stop structuring of elevations on wafers is provided to simply and reliably produce reliable solder stop and good flank protection of a 3D structure. CONSTITUTION: A resist(11) is deposited on a tip of a 3D(three-Dimensional) structure. Then, a solder stop layer(8) is deposited over the metallization and over the resist(11). The resist(11) on the tip of the 3D structure, including the solder stop layer(8) covering the resist, is subsequently removed so that an Au layer(7) on the tip of the 3D structure is exposed.
申请公布号 KR20040022178(A) 申请公布日期 2004.03.11
申请号 KR20030061724 申请日期 2003.09.04
申请人 INFINEON TECHNOLOGIES AG. 发明人 BRINTZINGER AXEL;UHLENDORF INGO;SCHENK ANDRE;WOLLANKE ALEXANDER
分类号 H01L21/44;H01L21/60;H01L23/485 主分类号 H01L21/44
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