发明名称 |
METHOD FOR SOLDER-STOP STRUCTURING OF ELEVATIONS ON WAFERS |
摘要 |
PURPOSE: A method for solder-stop structuring of elevations on wafers is provided to simply and reliably produce reliable solder stop and good flank protection of a 3D structure. CONSTITUTION: A resist(11) is deposited on a tip of a 3D(three-Dimensional) structure. Then, a solder stop layer(8) is deposited over the metallization and over the resist(11). The resist(11) on the tip of the 3D structure, including the solder stop layer(8) covering the resist, is subsequently removed so that an Au layer(7) on the tip of the 3D structure is exposed. |
申请公布号 |
KR20040022178(A) |
申请公布日期 |
2004.03.11 |
申请号 |
KR20030061724 |
申请日期 |
2003.09.04 |
申请人 |
INFINEON TECHNOLOGIES AG. |
发明人 |
BRINTZINGER AXEL;UHLENDORF INGO;SCHENK ANDRE;WOLLANKE ALEXANDER |
分类号 |
H01L21/44;H01L21/60;H01L23/485 |
主分类号 |
H01L21/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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