| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a high functional film which improves the yield, can permit cost reduction by simplifying the production system, and can also improve the quality. SOLUTION: The method for manufacturing the high functional film comprises forming at least one layer of a coating layer by applying on a substrate film, and then forming at least one layer of a thin film on the substrate film having the coating layer by an atmospheric pressure plasma discharge treatment apparatus which is directly linked to a coating apparatus. COPYRIGHT: (C)2004,JPO |
