| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure system which is capable of efficiently reducing an adverse effect caused by sneaking exposure light induced by a lens deterioration, and to provide a semiconductor device. SOLUTION: The exposure system 10 is equipped with a thermostatic chamber 12 where a lighting system 11 is annexed. A reticle stage 14 which positions a reticle 13 as holding it as a photomask, a blind unit 15 where blinds 151 located near to the reticle 13 are provided above the reticle stage 14, a projection optical system 16, and a wafer stage 17 where a semiconductor wafer Waf is mounted are provided inside the thermostatic chamber 12. At this point, the edge parts of the blinds 151 are arranged above the shading belts 131 of the reticle 13 as located near them. Exposure light EXL emitted from the lighting system 11 is uniformly distributed over the pattern region of the reticle 13 through an internal blind mechanism 111 and the blinds 151 of the blind unit 15. COPYRIGHT: (C)2004,JPO
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