GELATIN HARDENING SOLUTION, HARD COATING LIQUID, PHOTO MASK AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To easily improve scratch resistivity, chemical resistivity and humidity size stability of a photo mask, to provide gelatin hardening solution which does not reduce light transmissivity and to provide hard coating liquid which includes the gelatin hardening solution.

SOLUTION: The gelatin hardening solution includes at least one species selected from an aldehyde group-containing compound, a methylol radical content compound and an alkyl ether compound of methylol radical content compound. Moreover, the hard coating liquid includes the gelatin hardening solution, an ethylene unsaturated compound and a photopolymerization primer.

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