发明名称 WAFER RETAINER
摘要 PROBLEM TO BE SOLVED: To eliminate irregularity of temperature of a wafer retainer and obtain necessary temperature uniformity and temperature responsivity by installing a contact member which retains a peripheral part of a planar ceramic member and is connected with the metal case. SOLUTION: In the wafer retainer, a resistance heater is arranged on one main surface of the planar ceramic member, and a mounting surface for mounting a wafer is arranged on the other main surface. The wafer retainer is provided with a power supply part for supplying a power to the resistance heater, the metal case for surrounding the power supply part, and a nozzle which is arranged on the metal case and cools the planar ceramic member. Heat content of the metal case is made 0.5-3.0 times that of the planar ceramic member, so that the superior wafer retainer can be obtained wherein difference between temperatures in a wafer surface is small and cooling time is short. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004079653(A) 申请公布日期 2004.03.11
申请号 JP20020235456 申请日期 2002.08.13
申请人 KYOCERA CORP 发明人 NAKAMURA TSUNEHIKO
分类号 H05B3/06;H01L21/02;H01L21/027;H01L21/205;H05B3/74;(IPC1-7):H01L21/02 主分类号 H05B3/06
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