<p>A plasma processing system M1 comprising a processing section (20) for supporting a pair of long electrodes (30). A plurality of pull bolts (52) (means for blocking approach distortion) are provided at the processing section (20) while being spaced apart from each other in the longitudinal direction of the electrode (30). Head part of the pull bolt (52) is hooked on to a rigid plate (33) through a bolt holder (53) and the leg part is screwed into the electrode (30). The electrode can thereby be prevented from being distorted by a Coulomb force.</p>
申请公布号
WO2004021748(A1)
申请公布日期
2004.03.11
申请号
WO2003JP10944
申请日期
2003.08.28
申请人
SEKISUI CHEMICAL CO., LTD.;MAYUMI, SATOSHI;HINO, MAMORU;YASHIRO, SUSUMU;SHIMIZU, HARUKAZU