发明名称 PATTERN CONTOUR EXTRACTION METHOD, IMAGE PROCESSING METHOD, PATTERN EDGE RETRIEVAL METHOD, PROBE SCANNING METHOD, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE, PATTERN INSPECTION DEVICE AND PROGRAM
摘要 <P>PROBLEM TO BE SOLVED: To accurately and promptly extract a pattern contour even if a plurality of patterns exist in a same image or the contour shape of a measurement object pattern is complicated. <P>SOLUTION: The image of a pattern of inspection object is acquired (step S1). The rough edge location of the pattern is calculated from the image (step S2, S3). Then, a lattice animal is disposed based on the edge location (step S5), the disposed lattice animal is divided into star-shaped polygons (steps S6 to S11), the locations of the kernels of the star-shaped polygons are calculated (step S12), and an edge is searched from the calculated kernels toward the periphery of the lattice animal (step S13). <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004078659(A) 申请公布日期 2004.03.11
申请号 JP20020239194 申请日期 2002.08.20
申请人 TOSHIBA CORP 发明人 IKEDA TAKAHIRO
分类号 G01B11/00;G01B11/24;G06T1/00;G06T5/00;G06T7/60;H01L21/66 主分类号 G01B11/00
代理机构 代理人
主权项
地址