发明名称 |
PATTERN CONTOUR EXTRACTION METHOD, IMAGE PROCESSING METHOD, PATTERN EDGE RETRIEVAL METHOD, PROBE SCANNING METHOD, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE, PATTERN INSPECTION DEVICE AND PROGRAM |
摘要 |
<P>PROBLEM TO BE SOLVED: To accurately and promptly extract a pattern contour even if a plurality of patterns exist in a same image or the contour shape of a measurement object pattern is complicated. <P>SOLUTION: The image of a pattern of inspection object is acquired (step S1). The rough edge location of the pattern is calculated from the image (step S2, S3). Then, a lattice animal is disposed based on the edge location (step S5), the disposed lattice animal is divided into star-shaped polygons (steps S6 to S11), the locations of the kernels of the star-shaped polygons are calculated (step S12), and an edge is searched from the calculated kernels toward the periphery of the lattice animal (step S13). <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004078659(A) |
申请公布日期 |
2004.03.11 |
申请号 |
JP20020239194 |
申请日期 |
2002.08.20 |
申请人 |
TOSHIBA CORP |
发明人 |
IKEDA TAKAHIRO |
分类号 |
G01B11/00;G01B11/24;G06T1/00;G06T5/00;G06T7/60;H01L21/66 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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