| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a resonance device which can be adjusted to a target resonance frequency and a detuning frequency. <P>SOLUTION: The method for manufacturing the resonance device includes a process of forming a piezoelectric body 3 and an electrode on a silicon substrate, a process of patterning the piezoelectric body 3 and electrodes by photolithography, a process of forming a structure 1 by etching the silicon substrate, a process of forming a protection film on at least one surface of the structure 1, and a process of etching the surface where the protection film is not formed and etching along the thickness can be carried out with high precision because of the formation of the protection film while the resonance frequency is measured to enable adjustment to the specified detuning frequency. <P>COPYRIGHT: (C)2004,JPO |
