发明名称 TREATING SYSTEM FOR PHOTOGRAPHIC PROCESSING WASTE LIQUID
摘要 PROBLEM TO BE SOLVED: To provide a treating system for a photographic processing waste liquid by which the waste gas containing sulfite gas and ammonia gas produced during spray drying of a photographic processing waste liquid is reused and the waste liquid is easily treated at a low cost. SOLUTION: The photographic processing waste liquid produced from an automatic developing device for photographic process is treated by using a spray drying device to solidify an non-volatile component to recover and reuse the liquid. The air used for spray drying is reused by circulating. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004077731(A) 申请公布日期 2004.03.11
申请号 JP20020237071 申请日期 2002.08.15
申请人 FUJI PHOTO FILM CO LTD 发明人 HYODO TOMOYOSHI
分类号 G03C7/44;(IPC1-7):G03C7/44 主分类号 G03C7/44
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