发明名称 ELECTROPLATING APPARATUS AND ELECTROPLATING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a space-saving type electroplating apparatus and an electroplating method by which copper plating can uniformly be applied to the whole of a stock face with satisfactory glossiness. SOLUTION: In the electroplating apparatus, a belt-like stock M is carried into an electroplating tank 6 in a vertical state, and electroplating is continuously performed. In the upper solution in the electroplating tank 6, cathode electrode plates 30 and 31 are disposed, which energize the stock face while contacted with the face of the belt-like stock M to be carried-in. As for the shapes of the cathode electrode plates 30 and 31, the faces in contact with the faces of the belt-like stock M are ruggedly formed, and they are intermittently contacted. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004076092(A) 申请公布日期 2004.03.11
申请号 JP20020237480 申请日期 2002.08.16
申请人 EBARA UDYLITE KK;PLAMEX CORP;SETO ENGINEERING CO LTD 发明人 NAKA TOSHIHARU;EBIHARA SADAJI;TAKAMURE HITOSHI;KANETANI KOZO
分类号 C25D7/06;C25D17/10;C25D21/00;H01L21/288;(IPC1-7):C25D7/06 主分类号 C25D7/06
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