发明名称 POLISHING TABLE
摘要 PROBLEM TO BE SOLVED: To provide a polishing table wherein the polishing object surface of a workpiece is extremely flatly polished, warp and strain are hardly produced even if enlarging its diameter, so that the table is thinned and reduced in weight. SOLUTION: This polishing table comprising a negative electrode of a polishing device and electropolishing the polishing object surface of the workpiece disposed opposed to its surface via electrolyte is formed of conductive ceramic. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004074336(A) 申请公布日期 2004.03.11
申请号 JP20020236611 申请日期 2002.08.14
申请人 IBIDEN CO LTD 发明人 ABE HIDETO;KIRIYAMA KATSUYUKI
分类号 B23H3/00;(IPC1-7):B23H3/00 主分类号 B23H3/00
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