发明名称 METHOD AND EQUIPMENT FOR COATING WITH SOLUTION
摘要 PROBLEM TO BE SOLVED: To provide an equipment for coating with solution in which a resist liquid to be applied to a panel 1 of a cathode ray tube is kept in a proper state and the coating quality of the resist liquid can be maintained. SOLUTION: The resist liquid to be applied to the panel 1 of the cathode ray tube is contained into a coating application tank 27. The resist liquid recovered as an excess-component from the panel 1 of the cathode ray tube coated with the resist liquid is contained into a correction tank 28. The kinetic viscosity of the resist liquid contained in the correction tank 28 is measured by a measuring means 29. A diluent liquid is supplied to the correction tank 28 according to the result of the measurement to correct the resist liquid to the proper kinetic viscosity. The resist liquid of the proper kinetic viscosity in the correction tank 28 is applied to the tank 27. The resist liquid to be applied to the panel 1 of the cathode ray tube is maintained in the proper state and the coating quality of the resist liquid is maintained. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004073971(A) 申请公布日期 2004.03.11
申请号 JP20020236056 申请日期 2002.08.13
申请人 TOSHIBA CORP 发明人 SHINODA KAZUYOSHI;HARA OSAMU
分类号 B05D3/00;B05C11/00;B05C11/10;B05D7/00;H01J9/227;(IPC1-7):B05D3/00 主分类号 B05D3/00
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