发明名称 |
Sputtering target and method for making composite soft magnetic films with a sintered target |
摘要 |
High-saturation magnetization composite soft magnetic films can be deposited with sintered targets made of preferably at least two kinds of powders/elements with much lower saturation magnetization than that of the deposited soft magnetic films. Such a high-saturation magnetization composite soft magnetic film can be deposited by sputtering a plurality of species from a sintered target that forms a film of a material of higher saturation magnetization than that of the species.
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申请公布号 |
US2004045809(A1) |
申请公布日期 |
2004.03.11 |
申请号 |
US20030657067 |
申请日期 |
2003.09.09 |
申请人 |
ROU SHANGHSIEN;CHEN QIXU |
发明人 |
ROU SHANGHSIEN;CHEN QIXU |
分类号 |
C23C14/14;C23C14/34;G11B5/84;H01J37/34;(IPC1-7):C23C14/32 |
主分类号 |
C23C14/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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