发明名称 Sputtering target and method for making composite soft magnetic films with a sintered target
摘要 High-saturation magnetization composite soft magnetic films can be deposited with sintered targets made of preferably at least two kinds of powders/elements with much lower saturation magnetization than that of the deposited soft magnetic films. Such a high-saturation magnetization composite soft magnetic film can be deposited by sputtering a plurality of species from a sintered target that forms a film of a material of higher saturation magnetization than that of the species.
申请公布号 US2004045809(A1) 申请公布日期 2004.03.11
申请号 US20030657067 申请日期 2003.09.09
申请人 ROU SHANGHSIEN;CHEN QIXU 发明人 ROU SHANGHSIEN;CHEN QIXU
分类号 C23C14/14;C23C14/34;G11B5/84;H01J37/34;(IPC1-7):C23C14/32 主分类号 C23C14/14
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