| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a phase shift reticle by which an overlap positional precision between a light shielding film of the phase shift reticle and a phase shifter can be evaluated highly precisely, and a overlap plotting is conducted again when the overlapped positional precision is judged to be insufficient. <P>SOLUTION: In the manufacturing method, a first layer pattern is formed on the surface of a transparent substrate, resist is applied on the surface of the substrate which includes the first layer pattern, a plotting and a developing are conducted while a second layer pattern is overlapped, a second layer resist pattern is formed, a positional precision is measured for the overlapped plotting using an overlap position precision evaluation mark, in which the edge of the first layer pattern is covered by the second layer resist pattern, and a second layer pattern is formed. <P>COPYRIGHT: (C)2004,JPO</p> |
