发明名称 VERTICAL JUNCTION FIELD EFFECT TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a vertical junction field effect transistor having a low loss while a high drain breakdown voltage is maintained. SOLUTION: The vertical junction field effect transistor 1a includes an n+-type drain semiconductor part 2, an n-type drift semiconductor part 3, a p+-type gate semiconductor part 4, an n-type channel semiconductor part 5, and an n+-type source semiconductor part 7. The drift semiconductor part 3 is provided on a main surface of the semiconductor part 2 and has first-third regions 3b, 3c, 3d extended in a direction crossing with this main surface. The gate semiconductor part 4 includes a reverse conductivity type to the conductivity type of the semiconductor part 3, and is provided on first and second regions 3b, 3c of the semiconductor part 3. The semiconductor part 5 is provided along the gate semiconductor part 4, has a different conductivity type from the conductivity type of the semiconductor part 4 and is electrically connected to the third region 3d of the semiconductor part 3. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004079631(A) 申请公布日期 2004.03.11
申请号 JP20020235045 申请日期 2002.08.12
申请人 SUMITOMO ELECTRIC IND LTD 发明人 HOSHINO TAKASHI;HARADA MAKOTO;FUJIKAWA KAZUHIRO;HATSUKAWA SATOSHI;HIROTSU KENICHI
分类号 H01L29/80;H01L21/337;H01L29/06;H01L29/808;(IPC1-7):H01L29/80 主分类号 H01L29/80
代理机构 代理人
主权项
地址