发明名称 Method for fabricating semiconductor laser element and the same laser element
摘要 There is provided a semiconductor laser element which can change band gap wavelengths without change of composition of a multiple quantum well active layer and a method for fabricating a semiconductor laser module. In the method for fabricating a semiconductor laser element wherein a multiple quantum well active layer is formed on a semiconductor substrate with a crystal growth method, an insulation film is formed at the upper part of the multiple quantum well active layer, an electrode film is moreover formed on the insulation film and at least a part of the electrode film is electrically connected to the multiple quantum well active layer, distortion of the multiple quantum well active layer is controlled in the semiconductor laser element fabrication process after the process of the crystal growth method.
申请公布号 US2004047380(A1) 申请公布日期 2004.03.11
申请号 US20030358175 申请日期 2003.02.05
申请人 MORIYA HIROSHI;ASHIDA KISHO;HIRATAKA TOSHINORI;MORITA MAMORU 发明人 MORIYA HIROSHI;ASHIDA KISHO;HIRATAKA TOSHINORI;MORITA MAMORU
分类号 H01S5/022;H01S5/042;H01S5/20;H01S5/22;H01S5/32;H01S5/40;(IPC1-7):H01S5/00 主分类号 H01S5/022
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