| 摘要 |
PURPOSE: A method for forming high quality thin film using vacuum arc is provided to minimize lump defects of target material in the thin film produced from arc spot on the target material and apply vacuum arc thin film deposition method even to target material having low melting point and target material having low thermal conductivity. CONSTITUTION: The method comprises the steps of forming arc spot on a target by an ordinary mechanical or electrical method; forming a line of magnetic force on the surface circumference of the target so that direction of the magnetic force line on the surface of the target is perpendicular to straight moving trajectory of the arc spot, and left and right magnetic force lines formed by encircling expected straight moving trajectory of the arc spot form an acute angle of 90 degrees or less to the surface of the target to move the formed arc spot at a high speed in a length direction of the target; and cutting off supply of current of the arc spot before the arc spot reaches the end point of the target, and repeating the step of forming the arc spot after a certain period of time or immediately to the step of cutting supply of current of the arc spot so that the arc spot is not deviated from the target material after the arc spot is generated on the surface of the target, and the arc spot is straightly moved by a line of magnetic force formed on the surface of the target.
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