TREATING APPARATUS AND METHOD OF TREATING

摘要

In a treating apparatus, treating gases containing raw gases (TiCl4 and NH3) and inert gas (N2) are fed into treating vessel (2). The internal pressure of the treating vessel (2) is detected by means of pressure gauge (6), and the flow rates of treating gases fed into the treating vessel (2) are controlled on the basis of detection results. Purging of raw gases is performed with inert gas. The total flow rate of treating gases is controlled by fixing the flow rates of raw gases and controlling the flow rate of inert gas, so that the internal pressure of the treating vessel (2) is maintained constant. The time required for discharging of raw gases can be shortened, so that the time for switching of raw gases can be shortened. Further, the temperature of substrate surface during the treating can be maintained constant.