,申请号JP20010519909-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称
摘要
申请公布号	JP2004507440(A)	申请公布日期	2004.03.11
申请号	JP20010519909	申请日期	2000.08.31
申请人		发明人
分类号	C07D471/04;A61K31/44;A61K31/444;A61P31/04;(IPC1-7):A61K31/444	主分类号	C07D471/04
代理机构		代理人
主权项
地址

您可能感兴趣的专利

POLYVINYL ACETAL-INCLUDING SHEET HAVING IMPROVED FLUCTUATION OF UNIFORMITY IN THE LONGITUDINAL DIRECTION IN FULL SHEET WIDTH

POWER TRANSMISSION MECHANISM AND ELECTRIC POWER STEERING DEVICE INSTALLING THE MECHANISM

FEED EFFICIENCY IMPROVING METHOD

IMAGE PROCESSING DEVICE AND METHOD

POSITION ADJUSTMENT METHOD OF PROJECTED IMAGE

INFORMATION DISPLAY APPARATUS

ROTATING SHAFT SEAL AND ITS MANUFACTURING METHOD

PIEZOELECTRIC ELEMENT AND ITS MANUFACTURING METHOD, PIEZOELECTRIC ACTUATOR, AND INK-JET RECORDING HEAD

SOUND INSULATING APPARATUS FOR MACHINERY-GENERATED SOUND

MOUNTING STRUCTURE OF HIGH RIGID RUN CHANNEL AND FIXING PIECE

FLUID BEARING TYPE ROTATING DEVICE

IMAGE PROCESSING METHOD, IMAGE PROCESSOR, DISPLAY DEVICE, AND PROGRAM

OPTICAL DISK APPARATUS

COATING LIQUID FOR ACTIVE ENERGY-RAY CURABLE INKJET RECORDING MATERIAL, AND METHOD FOR MANUFACTURING INKJET RECORDING MATERIAL BY USING IT

POLYMER FOR HARD MASK FOR SEMICONDUCTOR ELEMENT AND COMPOSITION CONTAINING THE POLYMER

POSITIVE RESIST COMPOSITION FOR CIRCUIT SUBSTRATE, POSITIVE DRY FILM FOR CIRCUIT SUBSTRATE AND METHOD FOR PRODUCING CIRCUIT SUBSTRATE USING THE SAME

DEVICE FOR CORRECTING MASK PATTERN, PROGRAM FOR CORRECTING MASK PATTERN, AND METHOD FOR MANUFACTURING EXPOSURE MASK

SIGNAL PROCESSING APPARATUS, AND SIGNAL PROCESSING METHOD

DISPLAY DEVICE AND ITS CONTROL METHOD