发明名称 INTERLAYER INSULATING THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide an interlayer insulating porous silica zeolite thin film having high mechanical strength by enhancing breakdown voltage at a stable low dielectric constant. SOLUTION: In an interlayer insulating manufacturing application composition, a molar ratio of silica zeolite particles obtained to polycodensate four-functional alkoxysilane expressed in Si(OR<SP>2</SP>)<SB>4</SB>under presence of an organic amine and a silica precursor obtaining an alkoxylane having at least one univalent organic group as a main raw material is controlled in a specific range. A metal impurity in the composition containing an organic solvent is controlled in a specific range or less. In the porous silica zeolite thin film, a degree of silica crystallinity is in a specific range, and the content of the univalent organic group to an Si element in the film is in a specific range. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004079592(A) 申请公布日期 2004.03.11
申请号 JP20020234312 申请日期 2002.08.12
申请人 ASAHI KASEI CORP 发明人 O MASAYOSHI;HANABATAKE HIROYUKI
分类号 H01L21/768;H01L21/312;(IPC1-7):H01L21/312 主分类号 H01L21/768
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