发明名称 |
METHOD FOR RECYCLING SILICON FOCUS RING |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for recycling a focus ring used for a plasma etching system for manufacturing a semiconductor. SOLUTION: The method for recycling the silicon focus ring comprises the steps of assembling a first ring (4) obtained by machining a used focus ring and a second ring (7), and composing a combined silicon focus ring (9) having a shape compatiblity with a silicon focus ring used before. COPYRIGHT: (C)2004,JPO
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申请公布号 |
JP2004079983(A) |
申请公布日期 |
2004.03.11 |
申请号 |
JP20020280068 |
申请日期 |
2002.08.20 |
申请人 |
CREATIVE TECHNOLOGY:KK |
发明人 |
TATSUMI YOSHIAKI;MIYASHITA KINYA |
分类号 |
H01L21/3065;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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