发明名称 METHOD FOR RECYCLING SILICON FOCUS RING
摘要 PROBLEM TO BE SOLVED: To provide a method for recycling a focus ring used for a plasma etching system for manufacturing a semiconductor. SOLUTION: The method for recycling the silicon focus ring comprises the steps of assembling a first ring (4) obtained by machining a used focus ring and a second ring (7), and composing a combined silicon focus ring (9) having a shape compatiblity with a silicon focus ring used before. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004079983(A) 申请公布日期 2004.03.11
申请号 JP20020280068 申请日期 2002.08.20
申请人 CREATIVE TECHNOLOGY:KK 发明人 TATSUMI YOSHIAKI;MIYASHITA KINYA
分类号 H01L21/3065;(IPC1-7):H01L21/306 主分类号 H01L21/3065
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