发明名称 Process for detachably mounting a semiconductor substrate to be processed on a supporting wafer used in the production of semiconductor components comprises thinly grinding the substrate and removing the substrate from the wafer
摘要 Process for detachably mounting a semiconductor substrate (3) to be processed on a supporting wafer (1) comprises thinly grinding the substrate and removing the substrate from the wafer. The wafer is connected to the substrate or detached from it by applying a direct voltage.
申请公布号 DE10235814(B3) 申请公布日期 2004.03.11
申请号 DE20021035814 申请日期 2002.08.05
申请人 INFINEON TECHNOLOGIES AG 发明人 KROENER, FRIEDRICH
分类号 H01L21/68;H01L21/683;(IPC1-7):H01L21/58 主分类号 H01L21/68
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