发明名称 |
Process for detachably mounting a semiconductor substrate to be processed on a supporting wafer used in the production of semiconductor components comprises thinly grinding the substrate and removing the substrate from the wafer |
摘要 |
Process for detachably mounting a semiconductor substrate (3) to be processed on a supporting wafer (1) comprises thinly grinding the substrate and removing the substrate from the wafer. The wafer is connected to the substrate or detached from it by applying a direct voltage.
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申请公布号 |
DE10235814(B3) |
申请公布日期 |
2004.03.11 |
申请号 |
DE20021035814 |
申请日期 |
2002.08.05 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
KROENER, FRIEDRICH |
分类号 |
H01L21/68;H01L21/683;(IPC1-7):H01L21/58 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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