<p>A plasma processing system M1 comprising a processing section (20) for supporting a pair of long electrodes (30). A plurality of pull bolts (52) (means for blocking approach distortion) are provided at the processing section (20) while being spaced apart from each other in the longitudinal direction of the electrode (30). Head part of the pull bolt (52) is hooked o n to a rigid plate (33) through a bolt holder (53) and the leg part is screwed into the electrode (30). The electrode can thereby be prevented from being distorted by a Coulomb force.</p>
