发明名称 Sputter ion source
摘要 A source for sputter ions includes an ionizer (2), a cathode (3), a sputter insert (4), an activation electrode (5), a shielding cap (6) and a cathode insulator (7) in a vacuum-sealed casing. A shielding electrode (1) fits with a hollow cylindrical shape around a sputter cathode consisting of the cathode, the sputter insert and the shielding cap.
申请公布号 EP1396870(A2) 申请公布日期 2004.03.10
申请号 EP20030017996 申请日期 2003.08.07
申请人 FORSCHUNGSZENTRUM ROSSENDORF E.V. 发明人 FRIEDRICH, MANFRED, DR.;TYRROFF, HORST, DR.
分类号 H01J27/04;(IPC1-7):H01J27/20;H01J27/22 主分类号 H01J27/04
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