METHOD FOR FABRICATING PHOTOSENSITIVE PLANAR WAVEGUIDE DEVICE USING FHD PROCESS

摘要

PURPOSE: A method for fabricating a photosensitive planar waveguide device using a FHD process is provided to enhance a function of an optical waveguide by densifying a base including a bottom clad layer, a core layer, and a top clad layer. CONSTITUTION: Powders for forming a bottom clad layer, a core layer, and a top clad layer are sequentially deposited on a base having a silica layer. The base is densified by performing a co-sintering process. The base has the same refractive index by densifying the base. The base is fabricated by performing a heating process and a cooling process to form the silica layer on a silicon wafer. The heating process is performed under the temperature of 1100 degrees centigrade and a heating rate of 5 degrees centigrade/minutes within a furnace including steam. The cooling process is performed by using a wet oxidation method.