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发明名称
ION BEAM SPUTTER DEPOSITION PROCESS AND APPARATUS
摘要
申请公布号
EP1395688(A1)
申请公布日期
2004.03.10
申请号
EP20010941781
申请日期
2001.06.01
申请人
HONEYWELL INTERNATIONAL, INC.
发明人
COLE, BARRETT, E.;ZINS, CHRISTOPHER, J.
分类号
G01J1/02;C23C14/00;C23C14/08;C23C14/34;C23C14/46;G01J5/02;G01J5/20;G01K17/00;(IPC1-7):C23C14/00
主分类号
G01J1/02
代理机构
代理人
主权项
地址
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