| 摘要 |
A film thickness measuring method and apparatus capable of measuring a film thickness with high accuracy even if the spectral reflection intensity is not sufficiently high to measure an accurate film thickness and gives a poor S/N ratio. A spectral reflectance ratio S( lambda ) at a spot where the film under measurement is present and a spectral reflectance ratio R( lambda ) at a spot where the film under measurement is not present are measured to determine a spectral reflectance ratio Rmeas( lambda )=S( lambda )/R( lambda ). A theoretical value Rcalc( lambda ) of spectral reflectance ratio at an assumed film thickness d is determined, and an evaluation value Ed is determined from the total sum of differences between the value of Rmeas( lambda ) and the value of Rcalc( lambda ). The film thickness d is changed in steps of DELTA d in a measuring retrieval range of from dl to d2 to determine an evaluation value Ed at each film thickness, thereby obtaining an evaluation function E(d). Assuming that the spectral reflectance ratio Rmeas( lambda e) of the film is 1 (Rmeas( lambda e)=1), an evaluation value Enewd is determined from the total sum of differences between Rcalc( lambda e) at a certain film thickness d and Rmeas( lambda e)=1. The film thickness d is changed in steps of DELTA d between a measuring retrieval range of from d1 to d2 to determine Enewd at each film thickness, thereby obtaining an evaluation function Enew(d). An evaluation function ratio PE(d) is determined from E(d)/Enew(d), and a film thickness d that gives a minimum value of the ratio PE(d) is decided to be a measured film thickness D. |
