发明名称 APPARATUS FOR TREATING HAZARDOUS GAS WITH PLASMA
摘要 PURPOSE: Provided is an apparatus for treating hazardous gas with plasma, which can effectively use high temperature plasma, stably maintain plasma while treating large amount of hazardous gas and prevent abrasion of electrode generating arc discharge. CONSTITUTION: The apparatus(10) comprises a cathode assembly(20) for causing DC arc discharge inside an anode member(30) when a high voltage power is applied thereto, wherein the anode member(30) has an inside space where plasma is generated by the arc discharge caused between the cathode assembly(20), a gas inlet through which a gas to be turned into plasma is introduced, and a plasma holding unit connected to an end of the anode member(30) for stably maintaining generated plasma therein; a housing(60) for packing the cathode assembly(20) and the anode member(30) and having a hazardous gas storage zone and a hazardous gas inlet(61); and a flange(70) coupled to a lower end portion of the housing(60), communicated with the hazardous gas storage zone by a central penetrating hole and provided with a reaction gas inflow passage(71).
申请公布号 KR20040021285(A) 申请公布日期 2004.03.10
申请号 KR20020052893 申请日期 2002.09.03
申请人 APSYS CO., LTD. 发明人 CHA, U BYEONG;CHOI, GYEONG SU;KO, CHAN GYU
分类号 B01D53/32;(IPC1-7):B01D53/32 主分类号 B01D53/32
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