发明名称 |
Real time monitor method and system for extraction electrode |
摘要 |
A method and apparatus for monitoring an extraction electrode utilized in the implantation of charged particles (i.e., ions) on a semiconductor wafer. A signal may be generated from an encoder associated with the extraction electrode, wherein the signal comprises data indicative of charged particles attracted to and accelerated by the extraction electrode. The signal may then be analyzed either manually or automatically to determine if the extraction electrode is located at a position appropriate to attract and accelerate the charged particles to an acceleration tube for proper implantation thereof upon the semiconductor wafer. A main controller may be linked to the extraction electrode, wherein the main controller controls a location of the extraction electrode in proximity to the charged particles.
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申请公布号 |
US6703627(B2) |
申请公布日期 |
2004.03.09 |
申请号 |
US20020202215 |
申请日期 |
2002.07.24 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD |
发明人 |
LEE CHEN-CHUN;WANG CHIH-CHIEH;CHANG HON-YI;FAN CHUN-HUEI |
分类号 |
H01J37/317;(IPC1-7):G21K5/10;H01J37/08 |
主分类号 |
H01J37/317 |
代理机构 |
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