发明名称 THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD
摘要 PURPOSE: To provide a thin film forming apparatus which alternately supplies gaseous raw materials and can rapidly switch the supply of the gaseous raw materials and a method for the same. CONSTITUTION: When diaphragm energizing mechanisms 86-a and 86-b energize a diaphragm valve 83 to a casing side, a supply side aperture 92 of a supply line 91 for TiCl4 which is disposed in the upper face of a projecting part 85 and is connected to a supply line 21 of N2 is completely and directly shut off.
申请公布号 KR20040020821(A) 申请公布日期 2004.03.09
申请号 KR20030060525 申请日期 2003.08.30
申请人 TOKYO ELECTRON LIMITED 发明人 MORIYA SHUJI;KOJIMA YASUHIKO;ISHIZAKA TADAHIRO;KANNAN HIROSHI
分类号 C23C14/54;C23C16/44;C23C16/455;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C14/54
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