发明名称 |
THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD |
摘要 |
PURPOSE: To provide a thin film forming apparatus which alternately supplies gaseous raw materials and can rapidly switch the supply of the gaseous raw materials and a method for the same. CONSTITUTION: When diaphragm energizing mechanisms 86-a and 86-b energize a diaphragm valve 83 to a casing side, a supply side aperture 92 of a supply line 91 for TiCl4 which is disposed in the upper face of a projecting part 85 and is connected to a supply line 21 of N2 is completely and directly shut off.
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申请公布号 |
KR20040020821(A) |
申请公布日期 |
2004.03.09 |
申请号 |
KR20030060525 |
申请日期 |
2003.08.30 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MORIYA SHUJI;KOJIMA YASUHIKO;ISHIZAKA TADAHIRO;KANNAN HIROSHI |
分类号 |
C23C14/54;C23C16/44;C23C16/455;H01L21/205;(IPC1-7):H01L21/205 |
主分类号 |
C23C14/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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