发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR CHIP AND SEMICONDUCTOR CHIP
摘要 PURPOSE: To provide a method for manufacturing a semiconductor chip by which a time required for manufacturing it can be shortened and high integration and yield be improved, and a semiconductor chip using the same. CONSTITUTION: A semiconductor chip manufacturing device is used to apply isotropic etching to a cut part in a semiconductor wafer 100 to form grooves 110 and 130, as well as anisotropic etching thereto to form a groove 130. When the grooves 110, 120 and 130 are formed, the semiconductor wafer 100 is cut, and a semiconductor chip having a notched shape whose outer edge is not at a right angle.
申请公布号 KR20040020827(A) 申请公布日期 2004.03.09
申请号 KR20030060726 申请日期 2003.09.01
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 KOIZUMI NAOYUKI
分类号 H01L21/52;H01L21/301;H01L21/302;H01L21/304;H01L21/461;H01L21/50;H01L21/78;H01L23/34;(IPC1-7):H01L21/78 主分类号 H01L21/52
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