| 摘要 |
A polymer comprising recurring units of formulae (1) and (2) wherein R<1 >and R<3 >are H or methyl, R<2 >and R<4 >are C1-15 alkyl, R<5 >to R<8 >are H, or R<5 >and R<7>, and R<6 >and R<8 >form trimethylene or 1,3-cyclopentylene and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution and etching resistance and lends itself to micropatterning with electron beams or deep-UV.
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